Use of nitrides for flip-chip encapsulation

ABSTRACT

A hermetically-sealed semiconductor flip-chip and its method of manufacture are disclosed. The semiconductor flip-chip of the present invention is sealed with a silicon nitride layer on an active surface of the flip-chip. The silicon nitride layer covers the chip active surface, including bond pads and conductive connectors such as solder balls formed over the bond pads to effect electrical and mechanical connection to terminal pads of a carrier substrate. A portion of the silicon nitride layer is penetrated or removed to expose a portion of each conductive connector. The flip-chip is then attached to a substrate by contact of the exposed portions of the conductive connectors with the terminal pads of the substrate. Also included in the invention is the alternative of sealing the flip-chip, substrate and intervening connectors with a silicon nitride layer after the attachment of the flip-chip to the substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of application Ser. No. 09/138,038, filed Aug. 20, 1998, now U.S. Pat. No. 6,528,894, issued Mar. 4, 2003, which is a divisional of application Ser. No. 08/717,273, filed Sep. 20, 1996, now U.S. Pat. No. 5,956,605, issued Sep. 21, 1999.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to hermetically-sealed semiconductor chips. More particularly, the present invention relates to coating at least the active surface of a flip-chip with a silicon nitride sealing layer.

2. State of the Art

Chip On Board (“COB”) techniques are used to attach semiconductor die to a printed circuit board, including flip-chip attachment, wirebonding, and tape automated bonding (“TAB”). A flip-chip is a semiconductor chip or die that has a pattern or array of spaced terminals or pads on its active surface for face-down mounting of the chip to a printed circuit board or other conductor-carrying substrate. Generally, the flip-chip active surface carries one of the following types of electrical connector elements: Ball Grid Array (“BGA”)—wherein an array of minute solder balls (sometimes called C4 connections, for controlled-collapse-chip-connect) or other conductive material is disposed on the surface of a flip-chip that attaches to the substrate trace terminals or connecting pads (“the attachment surface”); or a Slightly Larger than Integrated Circuit Carrier (“SLICC”)—which is similar to a BGA, but having a smaller solder ball/conductive material pitch and diameter than a BGA. With the BGA or SLICC, the solder or other conductive ball or element arrangement on the flip-chip must be a mirror image of the connecting pads on the printed circuit board so that precise connection is made. When solder balls are employed, the flip-chip is bonded (electrically and mechanically connected) to the printed circuit board by reflowing the solder balls. Other conductive elements such as conductive epoxies or conductor-filled epoxies or other polymers may be employed in lieu of solder balls and heat-cured after chip attachment.

Semiconductor chips must be able to withstand a wide variety of environmental conditions such as moisture, ion bombardment, heat and abrasion. A significant amount of work has been directed toward various protective measures to minimize the exposure of semiconductor chips to these environmental conditions in order to increase their reliability and operating life.

Many prior art processes for protecting semiconductor chips have involved sealing or encapsulating the chips after they have been attached to their respective lead frame, printed circuit board, or other carrier substrate. Plastic encapsulation of semiconductor chips is currently the most common form of packaging chips. Plastic encapsulation normally consists of encasing a leadframe-mounted semiconductor die in plastic under pressure in a transfer molding process. Furthermore, so-called “glob top” (commonly silicones and epoxies) and underfill (commonly epoxies) materials have been used to protect chips secured on a printed circuit board (such as an FR-4 glass-epoxy board), or ceramic or silicon substrate. A non-conductive polymer underfill is generally disposed between the active surface of a “flipped” semiconductor chip and the printed circuit board or other carrier substrate for environmental protection and to enhance the mechanical attachment of the semiconductor die to the substrate. An overfill encapsulant of viscous liquid or gelled silicone or epoxy (glob top) is sometimes applied over an entire assembly after COB attachment. In short, it is known in the art to use layers of silicones, polyimides, epoxies, plastics, and the like for protection of the COB assemblies.

While transfer-molded plastic encapsulation and glob tops are effective methods of protecting the semiconductor die from abrasion and some mechanical damage, such approaches are of limited value, since most such packaging structures are permeable to environmental moisture and ions to a measurable degree. This permeability, however slight, leaves the semiconductor chip susceptible to degradation from electrochemical reactions with atmospheric contaminants. The numerous and extensive polymer/metal interfaces at the lead entries of an encapsulated semiconductor package afford ample opportunities for moisture ingress as well as allowing soluble ions present to provide an electrolyte for a corrosive failure mechanism of the semiconductor chip. Also, the extensive use of precious metals coupled with base metals in chips and packages provide DC galvanic potentials for electrochemical corrosion reactions and dendrite growth, which affect the performance and life of the encapsulated semiconductor chip.

As a result of the problems associated with the plastic encapsulation of semiconductor chips, it has been established as desirable to hermetically package chips to prevent external moisture and chemicals from contacting the semiconductor chip. U.S. Pat. No. 5,136,364 issued Aug. 4, 1992 to Byrne relates to hermetically sealing semiconductor chip bond pads to prevent moisture contamination along the interface of the multiple metal layers of typical bond pads. The hermetic sealing comprises layers of passivation materials wherein the upper passivation layer is a silicon dioxide and nitride combination or silicon carbide. The hermetic sealing can also include layers of glass and/or polyimide.

It is known to seal semiconductor chip active surface circuitry at the wafer stage of production by applying a passivation coating to the wafer with ceramic materials such as silica and/or silicon nitride by chemical vapor deposition (“CVD”) techniques. See, for example, U.S. Pat. Nos. 5,046,161, 5,084,752 and 5,406,122. However, the subsequent etching back of the passivation coating at the bond pads of the semiconductor chip may damage the passivation coating adjacent the bond pads, thereby affecting the reliability of the chip and shortening the life of the chip due to environmental corrosion. The sides of the passivation coating etched from the bond pad edges can also be permeable.

In an attempt to hermetically seal semiconductor chips without the use of external packages, U.S. Pat. No. 5,481,135 issued Jan. 2, 1996 to Chandra et al. suggests the use of lightweight ceramic protective coatings, such as those derived from hydrogen silsesquizane and silicate esters. These coatings are applied to the active surface of a semiconductor chip at a wafer level. Although the bond pads are subsequently exposed by removing a portion of the ceramic protective coating, the resultant circuits are purported to remain hermetically-sealed. However, the process of this patent requires the application of a diffusion barrier metal layer to protect the bond pads during the etching to expose the bond pads.

A room temperature plasma deposition system capable of applying a low-stress silicon nitride over components on a circuit assembly is disclosed by L. Gates in “Sealed Chip-on-Board,” Electronic Packaging & Production, September 1994, pp. 48-50 (the “Gates article”). In the described deposition process, a semiconductor die which is wire bonded to a substrate is subsequently entirely coated with silicon nitride. Thus, the silicon nitride covers the bond pads, bond wires, and other components of the assembly.

The disclosures of hermetically-sealed semiconductor chips described above, with the exception of the Gates article, fail to provide a process for sealing a wafer or semiconductor chip without damage to the semiconductor chip or bond pads from back etching to expose the bond pads, unless additional processing steps are employed. Gates, moreover, does not address the complexities of hermetically sealing a flip-chip type semiconductor die assembly. Therefore, it would be advantageous to develop a technique for simply, quickly and inexpensively forming a hermetic seal in combination with commercially-available, widely practiced semiconductor device fabrication techniques compatible with flip-chip attachment.

BRIEF SUMMARY OF THE INVENTION

The present invention relates to an apparatus and a method for providing a silicon nitride (Si₃N₄) hermetic seal over at least a portion of a flip-chip prior to attachment to a substrate. The present invention also contemplates and includes sealing the flip-chip and substrate with a silicon nitride layer after the attachment of the flip-chip to the substrate. The present invention is achieved by providing a semiconductor chip having a plurality of bond pads on an active surface, wherein at least some of the bond pads carry a solder ball or other conductive material (hereinafter “conductive connector”) disposed thereon (e.g., BGA or SLICC type arrangements).

A layer of silicon nitride, preferably a low temperature silicon nitride, is deposited on the active surface of the semiconductor chip to cover the exposed semiconductor die active surface and conductive connectors surmounting the bond pads thereon. The silicon nitride layer is preferably applied at a temperature of about ambient or room temperature to about 200° C., depending on the material of the printed circuit board or other carrier substrate, to a thickness of about 1 to 2 μm by CVD. These parameters usually require 600 seconds or less to complete the deposition. Optionally, the silicon nitride layer can be applied by plasma enhanced CVD deposition or other deposition techniques known in the art. The room-temperature deposition process of the Gates article is suitable, particularly for FR-4 and other temperature-susceptible boards. The silicon nitride layer, without additional materials or processing, provides protection from moisture-driven ionic corrosion. The active surface of the semiconductor chip being sealed, is thus protected from contamination and can be stored until needed in the semiconductor device fabrication process.

It is preferable to have the silicon nitride layer extend over the peripheral edges of the active surface of the semiconductor chip. By extending the silicon nitride layer over the semiconductor chip peripheral edges, the otherwise-exposed interfaces between the layers of circuitry carried on the semiconductor chip active surface and the interface between the circuitry and the underlying silicon (or other semiconductor substrate material, such as gallium arsenide) on which the circuitry is printed are hermetically sealed. This approach virtually eliminates the possibility of moisture or other contaminants infiltrating.

It is preferable to clean the semiconductor chip prior to coating with the silicon nitride layer. The semiconductor chip is preferably plasma cleaned with an oxygen (ozone) plasma system which removes organics and other contaminants from the surface of the semiconductor chip by pulling carbon into CO₂. As an alternative, solvent or other cleaning methods may be employed.

Before flip-chip attachment to the carrier substrate, a portion of the silicon nitride layer covering each conductive connector is removed to expose a portion of the conductive connector material. The removal of the silicon nitride portion can be achieved through etching, such as by dipping the outer tips of the conductive connectors in an etch solution. A preferred etching solution is a phosphoric acid solution at a temperature of about 100° C. to about 140° C.

The removal of the silicon nitride portion at the tips or free ends of the conductive connectors can also be achieved through mechanical abrasion, optionally assisted by chemical reaction. A preferred abrasion technique is the use of a rotating polishing pad, as employed in a technique known in the industry as chemical mechanical polishing (planarizing) or “CMP” (see U.S. Pat. No. 5,449,314 issued Sep. 12, 1995 to Meikle et al.). CMP involves holding a semiconductor chip against a rotating wetted polishing platen under controlled chemical, pressure and temperature conditions. Typically, an aqueous colloidal silica solution is used as the abrasive fluid. The polishing or workpiece material removal mechanism is a combination of mechanical action and chemical reaction, the surface of the workpiece being polished with the aqueous solution. Employing the CMP technique in the present invention also provides the additional benefit of achieving a relatively precise and uniform connector height for all connectors extending from the active surface of the wafer being processed.

The removal of the silicon nitride portion can also be achieved by fracturing the silicon nitride at the conductive connector tips by transverse impact against a hard surface. To effect the required fracture, the silicon nitrided connector tip portions of a wafer are simply impacted against the surface (“spanked”) with sufficient force to fracture the silicon nitride on the desired end portions of the conductive connectors. The spanking may either simply crack the silicon nitride, so that during solder reflow or epoxy cure, the conductive connector material penetrates the cracks to bond to the substrate terminal packs, or may completely break the silicon nitride off the end portions of the conductive connectors. The target impact surface may also be vibrated with ultrasonics for a more efficient “scrubbing” type removal of the silicon nitride portion during the spanking process.

As implied, it is, of course, understood that the above process steps can be, and desirably are, formed on a wafer level. The semiconductor chips may be diced immediately after the application of the silicon nitride layer or after the subsequent re-exposure of the conductive connector portion, although the latter approach is preferable. When a wafer is coated prior to dicing, it is preferable to scribe or etch a beveled channel or trough around the boundary of each semiconductor die location on the wafer prior to coating. The bevel extends through the circuit layers on the active surface into the underlying substrate. Thus, when the silicon nitride layer is deposited over the wafer active surface, the layer extends into the bevels (channels) and partially covers what will be the semiconductor die active surface peripheral edges when the wafer is subsequently diced. With this technique, the interfaces between the layers of circuitry on the semiconductor die active surface and between the circuitry and the underlying silicon on which the circuitry is formed are sealed, virtually eliminating the possibility of contaminant infiltration.

A semiconductor device according to the invention is assembled by attaching the flip-chip to a substrate having a plurality of terminal or connection pads on an active surface arrayed in a mirror image of the bond pads/conductive connectors of the silicon nitride coated semiconductor chip. The carrier substrate may comprise ceramic, silicon, polyimide or other polymers, FR-4, or similar materials; the particular substrate materials being insignificant to the practice of the invention except as to temperature and time limitations affecting the nitriding process employed. Subsequent to flip-chip attachment, the entire assembly is silicon nitrided, again preferably after plasma cleaning. It is noted that the silicon nitride CVD of the present invention is preferably performed at a temperature of about 50° C. to about 200° C., such process being well known in the art. While FR-4 (glass-epoxy laminate) board material has an upper temperature limit of about 175° C. before degradation is experienced, it has, however, been found by the inventors that the FR-4 material is sufficiently robust to withstand temperatures between 185° C. and 190° C. for short periods of time sufficient to achieve acceptable CVD of the silicon nitride. It is also noted that the use of a polyimide substrate material in combination with a silicon nitride coating as set forth in the present invention forms a hermetic seal with equivalent performance characteristics to a preformed ceramic package.

The nitrided flip-chip is attached to the substrate by contacting the exposed conductive connector portions with their respective substrate bond pads. With the use of solder balls, the solder is reflowed to attach to the substrate terminal pads. With epoxy conductive elements, a heat cure is effected. The reflowed solder balls or cured epoxy elements are protected from corrosion by the silicon nitride layer without the need for an underfill encapsulant. Once the flip-chip is attached to the substrate for further protection and sealing, a second passivation layer may be applied to the entire substrate/flip-chip assembly. The second passivation layer is also preferably silicon nitride applied in the manner described above.

A secondary advantage of the use of silicon nitride is that the relatively small thickness required for it to effectively function as an encapsulant results in low stress in the film. Thus, the application of the silicon nitride layer will not cause warpage of the substrate that may occur in some instances with the use of other forms of semiconductor chip encapsulation, such as the previously mentioned “glob top,” in combination with a carrier substrate of marginal structural rigidity.

It is, of course, understood that the semiconductor chip need not be coated (nitrided) prior to attachment to the substrate. The semiconductor chip can be first flip-chip attached with the silicon nitride layer applied thereafter to the entire assembly.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

While the specification concludes with claims particularly pointing out and distinctly claiming that which is regarded as the present invention, the advantages of this invention can be more readily ascertained from the following description of the invention when read in conjunction with the accompanying drawings in which:

FIG. 1 is a side cross-sectional view of a flip-chip;

FIG. 2 is a side cross-sectional view of the flip-chip of FIG. 1 having a silicon nitride coating on the active surface thereof;

FIG. 3 is a side cross-sectional view of the silicon nitride coated flip-chip of FIG. 2 with a portion of the silicon nitride coating removed to expose end portions of the conductive connectors;

FIG. 4 is a side cross-sectional view of a semiconductor assembly including the exposed flip-chip connectors of FIG. 3 attached to a substrate;

FIG. 5 is a side cross-sectional view of the first coated semiconductor assembly including the semiconductor assembly of FIG. 4 with a second silicon nitride coating subsequently applied;

FIG. 6 is a side cross-sectional view of the flip-chip of FIG. 1 having a silicon nitride coating which extends over the peripheral edges thereof;

FIG. 7 is a side cross-sectional view of a silicon nitride coated, pre-scribed wafer;

FIG. 8 is a side cross-sectional view of a second coated semiconductor assembly wherein a single silicon nitride coating is applied after flip-chip attachment;

FIG. 9 is a side cross-sectional view of a third coated semiconductor assembly; and

FIG. 10 is a side cross-sectional view similar to FIG. 3, but with the conductive connectors substantially exposed.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 1 illustrates a conventionally configured flip-chip 10 including a substrate 12 having a plurality of bond pads 14 disposed on its active surface 18. Each bond pad 14 has a conductive connector 16, such as a solder ball, conductive polymer or conductor-carrying polymer, disposed thereon.

FIG. 2 illustrates a silicon nitride-coated flip-chip 20. Components common to FIG. 1 and FIG. 2 retain the same numeric designation. The coated flip-chip 20 comprises the substrate 12 with bond pads 14 and conductive connectors 16. Any exposed portions of the active surface 18, conductive connectors 16 and bond pads 14 are covered by a layer of silicon nitride 22. The silicon nitride layer 22 is preferably applied at a temperature of about 50° C. to about 200° C. to a depth of about 1 to 2 μm by CVD and preferably plasma enhanced CVD, although sputtering evaporation or other known deposition methods are also suitable. However, the silicon nitride layer 22 may also be applied by other known deposition techniques, such as plasma deposition, as set forth in the Gates article.

It is important to note that Si₃N₄, or “silicon nitride” as referenced herein may contain impurities such as oxygen due to environmental conditions under which the deposition is effected. Therefore, silicon nitride coatings as employed in the invention are specifically contemplated to include such compounds, for example Si₃N₄, containing up to ten percent (10%) oxygen impurities, termed silicon oxynitride (SiON).

FIG. 3 illustrates an exposed-connector flip-chip 30. Components common to FIG. 2 and FIG. 3 retain the same numeric designation. The exposed-connector flip-chip 30 comprises the coated flip-chip 20 with a portion of the silicon nitride layer 22 adjacent the outer end of each conductive connector 16 having been removed or penetrated to expose an end portion 32 of each conductive connector 16. The removal of the silicon nitride portion can be achieved through etching the silicon nitride by dipping the tips of the conductive connectors 16 in an etch solution of phosphoric acid at about 100° C. to about 140° C. as previously noted. A straight hydrofluoric acid (HF) etch used at room temperature may also be used. Alternatively, dry plasma etches emloying a C₂F₆ plasma or an NF₃ plasma are suitable. Other alternatives include abrading away the silicon nitride on the tips of the conductive connectors 16 by mechanical abrasion alone (abrasive pad) or with a CMP apparatus and technique, by hitting the tips of the conductive connectors 16 perpendicularly against a preferably hard, target surface (with optional vibration of the surface), or by other suitable removal techniques as known in the art.

FIG. 4 illustrates a semiconductor device assembly 40. Components common to FIG. 3 and FIG. 4 retain the same numeric designation. The semiconductor device assembly 40 comprises the exposed-connector flip-chip 30 attached to a carrier substrate 42. The carrier substrate 42, terminal includes a plurality of terminal pads 44 on the upper or carrier surface 46 of the substrate 42, pads 44 being in communication with conductive traces on or within substrate 42. The pattern of substrate terminal pads 44 is the mirror image of the pattern of conductive connectors 16 on the exposed-connector flip-chip 30. The carrier substrate 42 may be made of ceramic, silicon, polyimide or other polymers, FR-4, or similar materials, and may be rigid or flexible, due to the aforementioned low-stress characteristics of the silicon nitride coatings employed in the invention. The exposed-connector flip-chip 30 is attached to the carrier substrate 42 by contacting the exposed conductive connector end portions 32 with their respective terminal pads 44, and reflowing (if a solder or other C4-type connection) or curing (if an epoxy or other adhesive polymer connection).

FIG. 5 illustrates a first coated semiconductor assembly 50. Components common to FIG. 4 and FIG. 5 retain the same numeric designation. The first coated semiconductor assembly 50 comprises the semiconductor device assembly 40 with the addition of a second passivation layer 52 applied to cover the previously uncoated surfaces of semiconductor device assembly 40, including at least the substrate carrier surface 46 as well as the sides 54 and back side 56 of flip-chip 10. The second passivation or sealing layer 52 is preferably silicon nitride applied in the manner described above for coating the flip-chip active surface 18.

FIG. 6 illustrates another coated flip-chip 60. The coated flip-chip 60 of FIG. 6 is similar to the coated flip-chip 20 of FIG. 2; therefore, components common to FIG. 2 and FIG. 6 retain the same numeric designation. The coated flip-chip 60 differs from the coated flip-chip 20 of FIG. 2 in that the silicon nitride layer 22 extends over the peripheral edges 62 of the flip chip 20. By extending the silicon nitride layer 22 over the flip-chip peripheral edges 62, interfaces 64 between circuitry layers 66 on the flip-chip active surface 18 and the underlying silicon 68 on which the circuitry layers 66 are formed are sealed. As shown in FIG. 6, the silicon nitride layer 22 extends over the entire side surface of coated flip-chip 60. Such a layer would be applied after singulation of coated chip 60 from the wafer on which it is formed. This is made possible by stretching the elastic film supporting the wafer on the wafer frame to physically separate the chips or dice sufficiently for side-coating of the individual components.

FIG. 7 illustrates a wafer 70. The wafer 70 of FIG. 7 is similar to the coated flip-chip 20 of FIG. 2, coated flip-chip 20 having been singulated from such a wafer 70; therefore, components common to FIG. 2 and FIG. 7 retain the same numeric designation. The wafer 70 has an etched or scribed, beveled channel or trough 72 extending into the wafer substrate 74 defining each discrete semiconductor die portion 76 on the wafer 70 prior to coating with silicon nitride. The troughs 72 preferably extend through all circuit layers into the semiconductive material of wafer substrate 74. When a silicon nitride layer 78 is deposited on the wafer 70, the silicon nitride layer 78 conformably extends into the troughs 72. Thus, the silicon nitride layer 78 at least partially covers what will be the flip-chip periphery edges of the active devices and circuitry when the wafer 70 is diced, and completely covers the circuitry layers at their exposed edges as well as the circuitry/wafer material interface. As a result, the interfaces 79 between the circuitry layers and between lowermost layer and the wafer substrate 74 on which the circuitry layers are formed are sealed.

FIG. 8 illustrates a second coated semiconductor assembly 80. The second coated semiconductor assembly 80 is similar to the first coated semiconductor assembly 50 of FIG. 5; therefore, components common to FIG. 5 and FIG. 8 retain the same numeric designation. The second coated semiconductor assembly 80 comprises the conventional flip-chip 10 (as shown in FIG. 1) attached to the carrier substrate 42. A silicon nitride layer 82 is applied after flip-chip attachment to cover the flip-chip 10 and the substrate carrier surface 46. Any exposed portions of the flip-chip 10, including the conductive connectors 16, such as solder or other conductive balls or elements, and bond pads 14, and the substrate carrier surface, including any exposed portions of the substrate terminal pads 44, are covered by a single silicon nitride layer 82. Therefore, one layer of silicon nitride eliminates the need for both an underfill and an outer encapsulant.

FIG. 9 illustrates a third coated semiconductor assembly 90. The third coated semiconductor assembly 90 is similar to the second coated semiconductor assembly 80 of FIG. 8; therefore, components common to FIG. 8 and FIG. 9 retain the same numeric designation. The third coated semiconductor assembly 90 differs from the second coated semiconductor assembly 80 of FIG. 8 in that the conductive connectors 16 (illustrated in FIG. 8 as solder balls or other reflowable or curable conductive connectors) are replaced by pins or other rigid elements 92. It will be appreciated by those of ordinary skill in the art, particularly from the illustration of FIG. 9, that the type of chip-to-substrate connection employed with the method of the invention may be as desired by the user, and is not limited to reflowable metallic or curable conductive adhesive polymeric elements applied to the chip. That is to say, pins, non-reflowable balls or other rigid mechanical connectors may be employed with appropriate adherent or other securing mechanisms to effect the electrical and mechanical chip-to-substrate connections followed by silicon nitriding.

FIG. 10 depicts an exposed-connector flip-chip 30 similar to that shown in FIG. 3 but with substantially exposed conductive connectors 16. Such exposure may be achieved by etching the silicon nitride layer 22 around conductive connectors 16 while protecting the portion of silicon nitride layer 22 covering active surface 18 and surrounding conductive connectors 16 with a protective layer 100. Protective layer 100 may comprise a positive or negative photoresist, as known in the art, or a screened-on or printed-on etchant-resistive material, as known in the art. As shown, protective layer 100 may desirably extend down the sides of exposed-connector flip-chip 30 whether or not silicon nitride layer 22 so extends. Protective layer 100 may be removed from exposed-connector flip-chip 30, as desired, or may remain thereon. Of course, if a subsequent nitride layer is to be applied after connection of exposed-connector flip-chip 30 to a carrier substrate, it is desirable to remove protective layer 100 to ensure mutual adhesion of the two silicon nitride layers.

Having thus described in detail preferred embodiments of the present invention, it is to be understood that the invention defined by the appended claims is not to be limited by particular details set forth in the above description as many apparent variations thereof are possible without departing from the spirit or scope thereof. 

1. A method for fabricating a semiconductor device assembly, comprising: providing a semiconductor component having an active surface including a plurality of bond pads thereon, at least one bond pad of the plurality of bond pads having a conductive connector disposed thereon; applying a silicon nitride-containing layer over at least the active surface and the conductive connector; removing a portion of the silicon nitride-containing layer to reveal a segment of the conductive connector; and attaching the revealed segments of the conductive connector to terminal pads on a surface of a substrate.
 2. The method of claim 1, wherein applying a silicon nitride-containing layer comprises covering at least a portion of peripheral edges of the semiconductor component bounding the active surface.
 3. The method of claim 1, further comprising applying a passivation layer over the semiconductor component and the substrate surface.
 4. The method of claim 3, wherein the passivation layer includes a second silicon nitride-containing layer.
 5. The method of claim 1, further comprising forming each the conductive connector from reflowable metallic material, conductive polymer material, or conductor-carrying polymer material.
 6. The method of claim 1, further comprising providing the conductive connector as substantially rigid elements.
 7. The method of claim 1, wherein the silicon nitride-containing layer is about 1 to 2 μm thick.
 8. The method of claim 1, wherein removing comprises etching the silicon nitride-containing layer from an end portion of the conductive connector.
 9. The method of claim 8, wherein etching comprises dipping the end portion of the conductive connector in a phosphoric acid solution.
 10. The method of claim 8, wherein etching is effected at a temperature of about 100° C. to about 140° C.
 11. The method of claim 1, wherein applying occurs at a temperature between room temperature and 200° C.
 12. The method of claim 1, wherein applying comprises plasma enhanced CVD deposition.
 13. The method of claim 1, further comprising cleaning the semiconductor component prior to the applying.
 14. The method of claim 13, wherein cleaning is effected with an oxygen plasma system.
 15. The method of claim 1, wherein removing comprises abrading a top portion of the silicon nitride-containing layer from the conductive connector.
 16. The method of claim 15, wherein abrading comprises chemical mechanical polishing.
 17. The method of claim 1, wherein removing comprises fracturing the silicon nitride-containing layer at a top portion of the conductive connector.
 18. The method of claim 1, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the applying.
 19. The method of claim 18, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the applying.
 20. The method of claim 19, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface.
 21. The method of claim 1, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the removing.
 22. The method of claim 21, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the applying.
 23. The method of claim 22, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface.
 24. A method for fabricating a semiconductor device assembly, comprising: providing a semiconductor component having an active surface including a plurality of bond pads thereon, at least some bond pads of the plurality of bond pads having conductive connectors disposed thereon; depositing a first silicon nitride-containing layer over at least the active surface and the conductive connectors; removing a portion of the first silicon nitride-containing layer to reveal a segment of each of the conductive connectors; attaching the revealed segments of each of the conductive connectors to terminal pads on a surface of a substrate; and applying a second silicon nitride-containing layer over the semiconductor component and the substrate surface.
 25. The method of claim 24, wherein the first silicon nitride-containing layer is about 1 to 2 μm thick.
 26. The method of claim 24, wherein removing comprises etching the first silicon nitride-containing layer from an end portion of the conductive connectors.
 27. The method of claim 26, wherein etching comprises dipping the end portion of the conductive connectors in a phosphoric acid solution.
 28. The method of claim 26, wherein etching is effected at a temperature of about 100° C. to about 140° C.
 29. The method of claim 24, wherein depositing occurs at a temperature between room temperature and 200° C.
 30. The method of claim 24, wherein applying comprises plasma enhanced CVD deposition.
 31. The method of claim 24, further comprising forming the conductive connectors from reflowable metallic material, conductive polymer material, or conductor-carrying polymer material.
 32. The method of claim 24, further comprising providing the conductive connectors as substantially rigid elements.
 33. The method of claim 24, further comprising cleaning the semiconductor component prior to applying.
 34. The method of claim 33, wherein cleaning is effected with an oxygen plasma system.
 35. A method for fabricating a semiconductor device assembly, comprising: providing a semiconductor component having an active surface including a plurality of conductive connectors extending transversely therefrom; coating the active surface and the plurality of conductive connectors with a silicon nitride-containing layer; applying a protective layer over the active surface and surrounding the plurality of conductive connectors; removing the silicon nitride-containing layer from the plurality conductive connectors; providing a substrate having a surface carrying terminal pads thereon; and attaching the plurality of conductive connectors to the terminal pads through exposed portions of the plurality of conductive connectors.
 36. The method of claim 35, wherein coating comprises covering at least a portion of peripheral edges of the semiconductor component bounding the active surface.
 37. The method of claim 35, further comprising applying a passivation layer over the semiconductor component and the substrate surface.
 38. The method of claim 37, wherein the passivation layer includes a second silicon nitride-containing layer.
 39. The method of claim 38, further comprising removing the protective layer prior to the applying the passivation layer.
 40. The method of claim 35, further comprising forming the plurality of conductive connectors from reflowable metallic material, conductive polymer material, or conductor-carrying polymer material.
 41. The method of claim 35, further comprising providing the plurality of conductive connectors as substantially rigid elements.
 42. The method of claim 35, wherein coating comprises providing a silicon nitride-containing layer about 1 to 2 μm thick.
 43. The method of claim 35, wherein removing comprises etching the silicon nitride-containing layer from the plurality of conductive connectors.
 44. The method of claim 43, wherein etching comprises dipping ends of the conductive connectors in a phosphoric acid solution.
 45. The method of claim 43, wherein etching is effected at a temperature of about 100° C. to about 140° C.
 46. The method of claim 35, wherein applying comprises plasma enhanced CVD deposition.
 47. The method of claim 35, further comprising cleaning the semiconductor component prior to the applying.
 48. The method of claim 47, wherein cleaning is effected with an oxygen plasma system.
 49. The method of claim 35, wherein removing comprises abrading the silicon nitride-containing layer from the plurality of conductive connectors.
 50. The method of claim 49, wherein abrading comprises chemical mechanical polishing.
 51. The method of claim 35, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the coating.
 52. The method of claim 51, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the applying.
 53. The method of claim 52, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface.
 54. The method of claim 35, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the removing.
 55. The method of claim 54, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the applying.
 56. The method of claim 55, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface.
 57. A method for producing a semiconductor device assembly, comprising: providing a semiconductor component having an active surface with integrated circuitry and a plurality of conductive connectors extending transversely therefrom, at least the active surface and each conductive connector of the plurality of conductive connectors covered with a silicon nitride-containing layer; removing a top portion of the silicon nitride-containing layer on each of the plurality of conductive connectors by striking the conductive connectors against a target surface; and attaching the top portions of the plurality of conductive connectors to terminal bond pads on a surface of a carrier substrate.
 58. The method of claim 57, wherein the target surface is ultrasonically vibrated during the striking.
 59. The method of claim 57, wherein providing a semiconductor component further comprises providing the semiconductor component including the silicon nitride-containing layer covering at least a portion of peripheral edges of the semiconductor component bounding the active surface.
 60. The method of claim 57, further comprising applying a passivation layer over the semiconductor component and the carrier substrate surface.
 61. The method of claim 60, wherein the passivation layer includes a second silicon nitride-containing layer.
 62. The method of claim 57, further comprising forming the plurality of conductive connectors from reflowable metallic material, conductive polymer material, or conductor-carrying polymer material.
 63. The method of claim 57, further comprising providing the plurality of conductive connectors as substantially rigid elements.
 64. The method of claim 57, wherein the silicon nitride-containing layer is about 1 to 2 μm thick.
 65. The method of claim 57, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the attaching.
 66. The method of claim 65, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the attaching.
 67. The method of claim 66, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface.
 68. The method of claim 57, wherein the semiconductor component comprises a wafer including a plurality of semiconductor chips and further comprising dicing the wafer immediately after the removing.
 69. The method of claim 68, further comprising etching a beveled channel around a boundary of each semiconductor chip of the plurality of semiconductor chips prior to the attaching.
 70. The method of claim 69, wherein the active surface includes integrated circuitry layers and the etching comprises extending the beveled channel through the integrated circuitry layers on the active surface. 